CS CLEAN SOLUTIONS · Process gas abatement

CLEANSORB FABLINE FX

Integrated backup column architecture delivering continuous operation within a reduced footprint

CLEANSORB FABLINE FX
CLEANSORB FABLINE FX · CS CLEAN SOLUTIONS

CLEANSORB FABLINE FX is an exhaust gas treatment system featuring an additional backup column that provides uninterrupted operation within a reduced footprint. The chemical chemisorption process itself is passive, consuming no power, heating, fuel, or water to neutralize process gases. Operating status and system modes are conveniently managed via a touch-screen display, featuring fully automated gas purging and column leak testing. Advanced remote connectivity is supported through USB, Ethernet, FTP, NTP, and OPC protocols. Manufactured from corrosion-resistant 316L stainless steel, FABLINE FX offers diverse configurations including an integrated fan and an optional SEMI-S2 compliant version equipped with redundant safety features.

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Technical Features

Integrated backup column architecture delivering continuous operation within a reduced footprint

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

Touch-screen control with automated gas purging routines and absorber leak testing

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

Advanced remote connectivity via USB, Ethernet, FTP, NTP, and OPC protocols

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

Applications

  • Continuous-duty Plasma Etching and Chemical Vapor Deposition (CVD) process lines
  • High-uptime Atomic Layer Deposition (ALD), Ion Implantation, and CIGS Photovoltaics lines

Configuration and Selection

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

  • Is an uninterrupted backup column required during primary column exchange?
  • Is remote automation via Ethernet, OPC, or FTP needed for your facility?
  • Does your physical layout require a reduced-footprint cabinet configuration?

CS CLEAN SOLUTIONS · Manufacturer technical source