CS CLEAN SOLUTIONS · Process gas abatement

CLEANSORB FABLINE

Passive chemisorption reaction requiring no electricity, heating, fuel, or water for gas removal

CLEANSORB FABLINE
CLEANSORB FABLINE · CS CLEAN SOLUTIONS

CLEANSORB FABLINE is the standard dry bed exhaust gas abatement system designed for the removal of harmful process gases at the production level. The chemical chemisorption process operates passively without requiring electricity, water, fuel, or heating for the scrubbing reaction. Available in three different column sizes, it adapts seamlessly to both pilot lines and full-scale manufacturing plants. The cabinet is constructed from corrosion-resistant 316L stainless steel with high-grade components. Automated procedures for pressure retention testing and inert gas purging facilitate column replacement. Optional configurations include an integrated fan and a SEMI-S2 compliant version to meet defined industrial safety standards in high-tech fabrication.

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Technical Features

Passive chemisorption reaction requiring no electricity, heating, fuel, or water for gas removal

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

Corrosion-resistant 316L stainless steel construction with automated pressure retention testing and purging

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

Optional integrated fan configuration and available SEMI-S2 safety compliance

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

Applications

  • Plasma Etching and Chemical Vapor Deposition (CVD) process exhaust lines
  • Atomic Layer Deposition (ALD), Ion Implantation, and CIGS Photovoltaic manufacturing

Configuration and Selection

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

  • What is the chemical composition and peak flow rate of the process gas?
  • Which of the three available column sizes suits your facility layout?
  • Is an integrated fan or a SEMI-S2 compliant version required?

CS CLEAN SOLUTIONS · Manufacturer technical source