CS CLEAN SOLUTIONS · Process gas abatement

CLEANSORB PRIMELINE

Dedicated chemisorber media specifically developed for critical hydrides like AsH3, PH3, and GeH4

CLEANSORB PRIMELINE
CLEANSORB PRIMELINE · CS CLEAN SOLUTIONS

CLEANSORB PRIMELINE is the fully-featured series of dry bed exhaust gas abatement systems, engineered for safety-critical applications such as Metal Organic Chemical Vapor Deposition (MOCVD). It uses dedicated chemisorber media developed for hazardous gases including AsH3, PH3, and GeH4. The system is thermally optimized to manage high-flow silicon and III-V epitaxial processes safely. Specialized safety functions include infrared temperature monitoring and inert gas cooling. While compact PS models incorporate a backup column, the larger PD model includes two full-size columns plus a backup column with touch-screen automated routines. An optional SEMI-S2 compliant version provides redundant safety features for critical production lines.

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Technical Features

Dedicated chemisorber media specifically developed for critical hydrides like AsH3, PH3, and GeH4

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

Thermal management featuring infrared temperature monitoring and inert gas cooling functions

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

Choice of compact PS model with backup column or dual full-size column PD model with touch screen

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

Applications

  • Safety-critical Metal Organic Chemical Vapor Deposition (MOCVD) exhaust abatement
  • High-flow Silicon and III-V epitaxial semiconductor manufacturing processes

Configuration and Selection

The absorber reaction operates passively; controls, fans and auxiliary equipment may require utilities. Capacity, media selection, replacement intervals and safety options depend on gas composition, concentration, flow and system configuration. Confirm the selected configuration with NOVEL and the manufacturer.

  • Does the process off-gas contain critical hydrides such as AsH3, PH3, or GeH4?
  • Is infrared thermal monitoring and inert gas cooling needed for high-flow gases?
  • Is the compact PS backup model or the dual full-size column PD model preferred?

CS CLEAN SOLUTIONS · Manufacturer technical source